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Representative Publications
European Patent Application No. 09842832.9 – (MURRAY), 10 October 2011, Corresponding to PCT/US2009/041806 – based on US Prov. No. 61/164,624 Capturing & Storing Excess Co2 by Seeding Melt Water Lakes from … Our Ref.: P09727EP00/DEJ - Our C/M Code: 2108LT-1011
Canada Patent Application No. [new] – (MURRAY) September 30, 2011 filed Corresponding to PCT/US2009/041806 – based on US Prov. No. 61/164,624 Capturing & Storing Excess Co2 by Seeding Melt Water Lakes from … Our Ref.: P09727CA00/DEJ - Our C/M Code: 2108LT-1012
Murray, Kenneth D.; Murray, Katherine Anne; Captured CO2 from Atmospheric, Industrial and Vehicle Combustion Waste, U.S. Patent 7,914,758 B2, March 2011.
Murray, Kenneth D.; Murray, Katherine Anne; International Application Number PCT/US09/45932, Filed: 6/21/2009, for Carbon Dioxide Control Device to Capture Carbon Dioxide from Vehicle Combustion Waste, Claims priority benefit of US Provisional Application No. 61/16,102, filed 11/19/2008
PCT Written Opinion: Patentable Subject matter found.
Murray, Kenneth D.; Murray, Katherine Anne; International Application Number PCT/US09/65114, Filed: 1111912009, for Carbon Dioxide Control Device to Capture Carbon Dioxide from Vehicle Combustion Waste,
Claims priority benefit of PCT/US09/45932 (above) as well as US Provisional
Application Number 61/116,102, filed 11/19/2008
PCT Written Opinion: Patentable Subject matter found.
Murray, Kenneth D.; Murray, Katherine Anne; U.S. National Stage Application Number 12/668,556. Filed: 111112010, for Captured C02 from Atmospheric, Industrial and Vehicle Combustion Waste, National stage application of 2) above
PCT Written Opinion: Patentable Subject matter found.
Bessy, Andrew; Doyle, James P; Gross, Vaughn P; Guarnieri, Richard C; Heh, Rick J; Murray, Kenneth D; Speidell, James L: Static Resistant Reticle, U.S. Patent 6,180,291, February 2001
Murray, Kenneth D.; Howell, Rachelle; Kurowski, John; Meyette, Erie; Irish, John.; Monitoring and Removing Particles in Chemical Delivery Systems. IBM Technical Report.TR19, 2000, February 2000
Murray, Kenneth D. (IBM); International SEMATECH Technology Transfer #98123639A-Eng (ESD Section), 1999
Murray, Kenneth D. (IBM); International SEMATECH Technology Transfer #98123645A-Eng (ESD Section), 1999
Murray, Kenneth D. (IBM); Thin Films Manufacturing – Electrostatic and Contamination Control Audit, East Fishkill, NY, IBM Internal Report, 1999
Murray, Kenneth D. (IBM); Thin Films Manufacturing – Electrostatic and Contamination Control Audit, East Fishkill, NY, IBM Internal Report, 1997
Murray, Kenneth D. (IBM); Advanced Semiconductor Technology Center – Electrostatic and Contamination Control Audit, East Fishkill, NY, Internal Communication, 1997
Murray, Kenneth D.; Gross, Vaughn P; Electric Field Shielded Enclosure, IBM Disclosure BU996013X. U.S., 1997
Murray, Kenneth D.; Electric Field Sensor and Shield, IBM Disclosure BU 8950247, U.S., 1996
Murray, Kenneth D.; Gross, Vaughn P (IBM); SEMI Standard E43-95: Recommended Practice for Measuring Static Charge on Objects and Surfaces, 1995
Batchelder, John S.; Gross Vaughn P., Gruver, Robert A., Hobbs, Phillip C.D.; Murray, Kenneth D.; Generation of Ionized Air for Semiconductor Chips, U.S. Patent 5,432,670, 1995
Batchelder, John S.; Gross Vaughn P., Gruver, Robert A., Hobbs, Phillip C.D.; Murray, Kenneth D.; Generation of Ionized Air for Semiconductor Chips, U.S. Patent 5,316,970, 1994
Fosnight, William J.; Gross, Vaughn P.; Murray, Kenneth D.; Wang, Richard D; SEMATECH Minienvironment Benchmarking Project (S49) 93051662A – AUM Yorktown, NY, 1993
Fosnight, William J.; Gross, Vaughn P.; Murray, Kenneth D.; Wang, Richard D; Deposition of 0.1 To 1.0 Micron Particles, Including Electrostatic Effects, Onto Silicon Monitor Wafers (Experimental), Microcontamination Conference Proceedings, Micro, 1993
Hobbs, Phillip C.D.; Gross, Vaughn P.; Murray, Kenneth D.; Suppression of Particle Emission in a Modified Clean Room Corona Air Ionizer, U.S. Patent 5,116,583, 1992
Murray, Kenneth D.; Gross, Vaughn P; Polymer Sensor Provides Record of Percent Relative Humidity Exposure, BU891-0065, Research Disclosure, 335 Mason Publications Ltd, England, 1992
Linde, Harold G.; Murray, Kenneth D.: Soluble Conductive Polyaniline Copolymers, IBM Technical Report TR-19.0969, 1992
Murray, Kenneth D.; Gross, Vaughn P.; Hobbs, Phillip C.D.; Batchelder, John S; Technique For Generating Contamination-Free Ionized Air Using Focused Laser Light, 13th EOS/ESD Symposium, Las Vegas, NV, 1991
Hobbs, Phillip C.D.; Batchelder, John S.; Gross, Vaughn P.; Murray, Kenneth D.; Ultraclean Air Ionization For Suppression of Particulate Surface Contamination, Proceedings of the 3rd Symposium, Particles on Surfaces: Detection, Adhesion and Removal, Particles on Surfaces 3, Plenum Press, New York. 1991
Linde, Harold G.; Murray, Kenneth D.; Conductive Polyaniline-Polystyrene Sulfonic Acid Copolymer Coating Solution, IBM Technical Disclosure Bulletin, Vol. 33, No. 6B, 1990
Hobbs, Phillip C.D.; Gross, Vaughn P.; Murray, Kenneth D.; Suppression of Particle Emission in a Modified Clean Room Corona Air Ionizer, J. Aerosol Sci, Vol. 21, No.3, 1990
Murray, Kenneth D.; Gross, Vaughn P.; Hobbs, Phillip C.D; Clean Corona Ionization, 12th EOS/ESD Symposium Proceedings, Orlando, FL, 1990
Murray, Kenneth D.; Gross, Vaughn P; Ozone and Small Particle Production By Steady-State DC Ionizers: An Evaluation, 11th EOS/ESD Symposium Proceedings, New Orleans, LA, 1989
Murray, Kenneth D.; Improved Chip Yield: Photolithography Resist Inspection Using Monochromatic Helium, IBM Burlington Technical Report, TR-19.0810, 1988
Murray, Kenneth D.; Ainsworth Galen F.; Gross, Vaughn P; Hood Ionization in Semiconductor Wafer Processing: An Evaluation, 10th EOS/ESD Symposium, Anaheim, CA, 1988
